Figure 5: The schematic illustration showing the atomic structure of silicon materials and nanowear test details.
From: Effect of crystal plane orientation on tribochemical removal of monocrystalline silicon

(a) The configuration of Si(100), Si(110) and Si(111) samples. (b) The upper AFM tips moved horizontally on the silicon samples with displacement amplitude D of 500 nm and normal loads of 0.5 ~ 3 μN. The inset SEM images show the SiO2 tip with R of 1 μm and the diamond tip with R of 0.25 μm. The relative humidity was controlled from 0% to 80%.