Figure 3: Experimental results for the simultaneous imaging of magnetic field and temperature distribution for various wavelengths of probing light and MOIs.

(a) MCD and absorption images for three selected wavelengths of probing light (red: λ = 625 nm; green: λ = 530 nm; blue: λ = 470 nm) for MOIs with bismuth concentrations of 1.0 and 2.0. (b) Changes of MCD signals as a function of applied magnetic field perpendicular to the MOI surface: x = 2 MOI at λ = 530 nm (black line); x = 1 MOI at λ = 530 nm (red line); x = 1 MOI at λ = 470 nm (green line). (c) Optical absorption changes as a function of applied electrical power to the PCB circuit: x = 1 MOI at λ = 530 nm (red line); x = 2 MOI at λ = 530 nm (black line); x = 2 MOI at λ = 625 nm (green line); gold thin film at λ = 530 (blue line). (d) Optical absorption changes as a function of applied electrical power under external static magnetic field: 0 mT (black line); 22 mT (red line); 45 mT (green line); 67 mT (blue line).