Table 2 Comparison of graphene patterning obtained individually through three types of stencil masks by different magnetic-assisted UV/ozonation processes.
From: Patterning Graphene Film by Magnetic-assisted UV Ozonation
Mask type/Thickness | Nickel/10 μm | Sapphire/316 μm | Steel/30 μm | ||
|---|---|---|---|---|---|
Magnetic field | 0 | 0 | BZ = 0.31 T, ∇BZ = 90 T/m | BZ = 19 mT, ∇BZ = 4.5 T/m | BZ = 0.31 T, ∇BZ = 90 T/m |
Lateral under-oxidation/μm | 4–5 | >200 | 8 | >30 | 3–4 |
Trait | Poor conformity | Magnetic-induced directional etching | Magnetic-enhanced conformity | ||
