The in-situ growth of epitaxial GaN with a short-range ordered (SRO) BN interlayer is proposed to demonstrate a high manufacturing scalability of the epitaxial lateral overgrowth (ELOG) process. During the GaN growth, the mask formation of the SRO BN occurred in the on-site chamber within a few minutes. The BN interlayer efficiently reduced microstructural defects, such as screw-type and edge-type threading dislocations, to achieve high structural and optical characteristics of the GaN overlayer, whose results are comparable to those of the previously reported ex-situ ELOG approaches. These improvements were also demonstrated in the device performances of the GaN light-emitting diodes.
- Heesoo Kim
- Anh Thi Dieu Nguyen
- Kunook Chung