Intense high energy laser pulses can be used on materials to produce and control features at the nanoscale, which is necessary for future generation of nanodevices. The authors report an experimental study of damage and crater formation in silicon substrates formed by focusing ultrashort extreme ultraviolet pulses from a Free Electron Laser in Japan proving a proof of concept for high control in material processing for a variety of applications.
- Thanh-Hung Dinh
- Nikita Medvedev
- Masaharu Nishikino
