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Lithography roadmap on track

Nature Photonics volume 4, page 20 (2010)Cite this article

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The collective event, organized by the semiconductor industry consortium SEMATECH, covered technology, infrastructure and the business challenges that the industry must address for commercial manufacturing at the 22 nm half-pitch node.

Highlights from the symposia included a report from the laser developer Cymer that its laser-generated plasma sources can now generate 50 W of 13 nm EUV light at intermediate focus. High-volume commercial lithography will ultimately require around 180 W of power to expose 100 wafers per hour. Researchers also reported that 193 nm immersion lithography has successfully been extended to the 22 nm node using a variety of double-patterning approaches, including spacer, double etch and resist-freezing processes, as well as litho-etch–litho-etch and source–mask optimization schemes.

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Lithography roadmap on track. Nature Photon 4, 20 (2010). https://doi.org/10.1038/nphoton.2009.253

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