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Origin of logarithmic resistance correction in graphene

Nature Physics volume 8, page 352 (2012)Cite this article

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Chen et al.1 recently presented data of a logarithmic low-temperature anomaly in the resistance of graphene flakes and attributed this to Kondo physics. The samples were irradiated beforehand with ions, and the appearance of a logarithmic anomaly was linked to the presence of induced defect states with unpaired electrons.

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Figure 1: Comparison between EEI correction2,3 and experimental data1.

References

  1. Chen, J-H., Li, L., Cullen, W. G., Williams, E. D. & Fuhrer, M. S. Nature Phys. 7, 535–538 (2011).

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  2. Altshuler, B. L. & Aronov, A. G. in Electron-Electron Interactions in Disordered Systems (eds Efros, A. L. & Pollak, M.) 1–154 (North Holland, 1985).

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  3. Jobst, J., Waldmann, D., Gornyi, I. V., Mirlin, A. D. & Weber, H. B. Phys. Rev. Lett. 108, 106601 (2012).

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  1. Lehrstuhl für Angewandte Physik, Friedrich-Alexander-Universität Erlangen-Nürnberg, Staudtstr. 7, Erlangen, 91058, Germany

    Johannes Jobst & Heiko B. Weber

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  1. Johannes Jobst
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  2. Heiko B. Weber
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Correspondence to Heiko B. Weber.

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Jobst, J., Weber, H. Origin of logarithmic resistance correction in graphene. Nature Phys 8, 352 (2012). https://doi.org/10.1038/nphys2297

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