Fig. 17: Selective thermal oxidation for micro-LED fabrication.
From: Advanced technologies in InGaN micro-LED fabrication to mitigate the sidewall effect
a Schematic of the fabrication process flow, b 10 µm pixel display schematic diagram, c SEM images of 2.3 µm micro-LED pixelation by STO. Reproduced from ref. 186 © 2024, Z. Liu et al. under the terms of the Creative Commons Attribution 4.0 License
