Fig. 3: Substrate scope for the hydrosilylation of alkenes with DHSCB (1f).

^a1f (0.76 mmol, 0.30–0.4 M in Et₂O), 2 (0.5 mmol), i-Pr₃SiSH (10 mol%), THF (1 mL), 390 nm (6 W), 36–48 h. ^b1f (1.52 mmol, 0.30–0.4 M in Et₂O), 2o (0.5 mmol), i-Pr₃SiSH (10 mol%), THF (1 mL), 390 nm (6 W), 60 h. ^c1f (1.14 mmol, 0.30–0.4 M in Et₂O), 2 (0.5 mmol), i-Pr₃SiSH (10 mol%), THF (1 mL), 390 nm (6 W), 48 h. ^d1f (1.14 mmol, 0.30–0.4 M in Et₂O), 2 (0.75 mmol), i-Pr₃SiSH (10 mol%), THF (1 mL), 390 nm (6 W), 48 h; then the mixture was concentrated under vacuum and 2’ (0.5 mmol) and THF (2 mL) was added and the resulting mixture was stirred under 390 nm (6 W) for 48 h. ^e1f (1.52 mmol, 0.30–0.4 M in Et₂O), 2 (1 mmol), i-Pr₃SiSH (10 mol%), THF (1 mL), 390 nm (6 W), 48 h; then the mixture was concentrated under vacuo and 2’ (0.5 mmol), i-Pr₃SiSH (5 mol%) and THF (2 mL) was added and the resulting mixture was stirred under 390 nm (6 W) for 48 h.