Fig. 2: Composition analysis of series BiVO4:Mo samples with different etched depth. | Nature Communications

Fig. 2: Composition analysis of series BiVO4:Mo samples with different etched depth.

From: Etched BiVO4 photocatalyst with charge separation efficiency exceeding 90%

Fig. 2

XPS (a) V 2p, (b) Bi 4 f, (c) O 1 s, and (d) Na 1 s of series BiVO4:Mo(NaOH) samples with different etched depth. e Schematic diagram of the ion-substituted layer in BiVO4:Mo(NaOH). Herein, 1, Ar+ sputtering 1 nm, 2, Ar+ sputtering 2 nm, 3, Ar+ sputtering 3 nm, 4, Ar+ sputtering 4 nm, 5, Ar+ sputtering 5 nm.

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