Fig. 2: Resin composition, absorption characteristics, and photo-rheological behavior.
From: Spatial control of curing kinetics in thiol-ene-systems through antagonistic photoreactions
a Resin formulation with photoinitiator and photobase generator. b Absorption spectra of CQ and NPPOC-TMG versus the emission spectra of the light sources used. c Comparison of the photorheological behavior of the resin with and without prior photobase release. The gelpoint is marked through a dashed vertical line as the crossover of storage modulus (G’) and loss modulus (G’’).
