Fig. 9: Predictions of the surface kinetic model for RIE. | npj Computational Materials

Fig. 9: Predictions of the surface kinetic model for RIE.

From: A neural master equation framework for multiscale modeling of molecular processes: application to atomic-scale plasma processes

Fig. 9

a Time-evolution of the number of F atoms at 1100 total impacts and 90 eV Ar+ energy. The solid blue line, black dash-dot line, and red dashed line represent the number of F atoms in the mixed layer (I), surface (II), and bulk gas (III), respectively. b Time-evolution of Si etch rate (Å/s) at 1100 total impacts and 90 eV Ar+ energy.

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