Extended Data Fig. 2: Impact of deposition on modeled oxidation by OH radicals.
From: Formation of late-generation atmospheric compounds inhibited by rapid deposition
Organic aerosol formation and product OH reactivity with and without deposition in modeled OH oxidation by in chemically explicit ‘precursor-oxidant’ cases of a) isoprene-OH, b) benzene-OH, c) toluene-OH, and d) limonene-OH oxidation reactions. The initial concentrations of precursors were set at 1 ppb and the OH concentrations were held at 1 × 106 molecules cm−3. Models with deposition are dashed lines (orange: OH reactivity; blue: total OA) and without deposition are solid lines.
