Abstract
Reactive organic carbon species are important fuel for atmospheric chemical reactions, including the formation of secondary organic aerosol. However, in parallel to atmospheric oxidation processes, deposition can remove compounds from the atmosphere and impact downstream environments. To understand the impact of deposition on atmospheric oxidation, we present a framework for predicting and visualizing the fate of a molecule on the basis of the physicochemical properties of compounds (Henry’s law constant, vapour pressure and reaction rate constants), which are used to estimate timescales for oxidation and deposition. By implementing our deposition rates in chemical models, we show that deposition substantially suppresses atmospheric reactivity and aerosol formation by removing early-generation products and preventing the formation of large fractions (up to 90%) of downstream, late-generation compounds. Deposition is frequently missing in the laboratory experiments and detailed chemical modelling, which probably biases our understanding of atmospheric composition.
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Data availability
The lifetimes and physicochemical properties of the compounds shown in Fig. 2 and ~140,000 additional compounds are publicly available via Mendeley (https://doi.org/10.17632/3rgvkf7c9n) (ref. 27). The compounds used in the chemically explicit modelling are freely available through the Master Chemical Mechanism (https://mcm.york.ac.uk/MCM/) and referenced publicly available works. Deposition lifetimes for all compounds used in the chemically explicit box model are provided as Supplementary Dataset 1. These data and the referenced publicly available models were used to generate Figs. 3, 5 and 6 and Extended Data Figs. 2–4. All information to generate Figs. 1 and 4 is described in Methods and Supplementary Information. Source data are provided with this paper.
Code availability
Models used in this work are publicly available as cited. The F0AM model was used as provided, with additional reactions added as described in the article and Supplementary Information. The SimpleSOM model was modified slightly to include deposition as described in the article; the modified code has been provided to the authors of the model for inclusion in their next publicly available release.
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Acknowledgements
We appreciate J. Kroll for useful comments that improved this paper and thank B. Murphy, H. Pye, J. Bash and H. Foroutan for valuable scientific discussions on this topic. This work was supported by the Department of Energy Office of Biological and Environmental Research (DE-SC0022020, supporting G.I-V.W. and C.B.) and the National Science Foundation Atmospheric and Geospace Sciences CAREER programme (AGS-2046367, supporting G.I-V.W.).
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C.B. and G.I.-V.W. contributed equally to this work. C.B. performed data analysis and led model implementations and interpretation. G.I.-V.W. conceived the study, contributed to data analysis and conducted modelling. Both authors contributed substantially to writing and editing.
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Extended data
Extended Data Fig. 1 Sensitivity analysis of the deposition timescales to leaf area index (LAI).
Deposition timescale versus oxidation timescale for chemical species in F0AM is shown for a) LAI = 4.7 and b) LAI = 0.47. Markers are sized by relative concentration without deposition and colored by the normalized loss of concentration with and without the implementation of deposition (that is, Δconcentration(Dep-NoDep)/concentration(NoDep)) for simulated precursors and oxidants in the SOAS campaign at 3 hours of the simulation. The impact of transport to the free troposphere is not included here.
Extended Data Fig. 2 Impact of deposition on modeled oxidation by OH radicals.
Organic aerosol formation and product OH reactivity with and without deposition in modeled OH oxidation by in chemically explicit ‘precursor-oxidant’ cases of a) isoprene-OH, b) benzene-OH, c) toluene-OH, and d) limonene-OH oxidation reactions. The initial concentrations of precursors were set at 1 ppb and the OH concentrations were held at 1 × 106 molecules cm−3. Models with deposition are dashed lines (orange: OH reactivity; blue: total OA) and without deposition are solid lines.
Extended Data Fig. 3 Impact of deposition on modeled oxidation by ozone.
Organic aerosol formation and product OH reactivity with and without deposition in modeled ozone oxidation in chemically explicit ‘precursor-oxidant’ cases of a) isoprene-O3, b) benzene-O3, c) toluene-O3, and d) limonene-O3 oxidation reactions. The initial concentrations of precursors were set at 1 ppb and the O3 concentrations were held at 60 ppb. Models with deposition are dashed lines (orange: OH reactivity; blue: total OA) and without deposition are solid lines.
Extended Data Fig. 4 Impact of deposition on modeled aerosol composition.
Concentrations of the top five dominant aerosol-phase species in the simulation of the α-pinene and OH system (a) without the implementation of deposition and (b) with deposition implemented.
Extended Data Fig. 5 Impact of deposition as a function of product generation.
Ratio of concentration of a species in model runs including vs. not including deposition, with compounds categorized by oxidation generation. Loss of (a) gas-phase species and (b) particle-phase species via deposition. Dots represent chemical species simulated in F0AM at 48 hours (that is, end of simulation) for the α-pinene + OH oxidation reactions. The width of the violin at a given level is proportional to the aggregated relative abundance of chemicals near that level.
Extended Data Fig. 6 Comparison of deposition to wall loss in modeled oxidation chamber experiments.
Modeled organic aerosol formation using the SimpleSOM model33 under the a) ‘oxidation only’ condition where 45 ppb α-pinene was oxidized by OH = 2 × 106 molecules cm−3 with deposition and vapor wall loss turned off; b) ‘oxidation only’ condition with deposition implemented; c) ‘oxidation only’ condition with default vapor wall loss rate in SimpleSOM; and d) ‘oxidation only’ condition with a factor of ten higher default vapor wall loss rate.
Supplementary information
Supplementary Information
Supplementary Figs. 1–5 and Discussion.
Supplementary Data 1
Deposition lifetimes of all compounds used for chemically explicit modelling, assuming both leaf area index = 4.7 and leaf area index = 0.47. Data used for all chemically explicit modelling to generate main figures and extended data figures.
Source data
Source Data Fig. 2
Raw data for data points shown.
Source Data Extended Data Fig. 1
Raw data for data points shown.
Source Data Extended Data Fig. 6
Raw data for data shown.
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Bi, C., Isaacman-VanWertz, G. Formation of late-generation atmospheric compounds inhibited by rapid deposition. Nat. Geosci. 18, 213–218 (2025). https://doi.org/10.1038/s41561-025-01650-2
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DOI: https://doi.org/10.1038/s41561-025-01650-2