Extended Data Fig. 1: Design of Wolter-III based AKB mirrors.

(a) Cross-section of the Wolter-III based AKB mirrors designed for sub-10 nm focusing of XFEL. (b) Mirror shapes and radii of curvature of the designed four mirrors. (c) Lateral profiles of multilayer parameters: d-space, Pt-layer thickness, C-layer thickness, and γ parameter. (d) Reflectivities of the multilayers measured and calculated at a photon energy of 8.048 keV (Cu Kα). Results of the film thickness/roughness are summarized in inset tables.