Fig. 1: Principle of SIMFLUX.
From: Localization microscopy at doubled precision with patterned illumination
a, A sinusoidal illumination pattern is created in a total internal reflection–SIM setup by two counter propagating evanescent waves. Fast switching between two orthogonal line patterns is achieved by placing two piezo mounted gratings in the two arms of a polarizing beam splitter, selecting the operational arm by a polarization switching Pockels cell. b, A total of six images are recorded with three shifted patterns per orthogonal orientation of the line pattern. Combining the centroid estimates of the six frames with precision σcentroid (σcen) with the photon count in relation to the pattern shift improves the localization precision with a factor of around two compared to the standard centroid estimate on the sum of the six frames.
