Fig. 1
From: Unconventional magnetoresistance and resistivity scaling in amorphous CoSi thin films
Characterization of CoSi amorphous films. (a) FFT transform of the CoSi layer from STEM image of the 4.8-nm thick sample (shown in b). The circular dispersion reveals the amorphous nature of the film. (b) and (d) Cross-sectional STEM images of the 4.8-nm and 2.0-nm films, respectively, showing no signs of residual polycrystalline phase. (c) AFM measurement of the 2.0-nm sample showing a mean surface roughness of 0.11 nm.
