Table 2 Detailed table of ICP power experiment parameters.
From: Experimental study of inductively coupled plasma etching of patterned single crystal diamonds
ICP power (W) | RF power (W) | O2/Ar (sccm) | Chamber pressure (mTorr) | |
|---|---|---|---|---|
Experimental parameters | 200 400 600 800 1000 | 120 | 50/50 | 20 |
