Table 2 Sporicidal effect on Bacillus subtilis spores inflicted by each device after 30 min of non-thermal plasma (NTP) exposure represented by colony forming units (CFU) Inhibition and Inhibition zones.
From: Modified protocol comparing sporicidal activity of different non-thermal plasma generating devices
Device code | CFU inhibition [%] | Inhibition zone [%] | Power [W] | ∆ log CFU |
|---|---|---|---|---|
UV (positive control) | 99.992 ± 0.005 | 95.1 ± 0.7 | - | 4.097 |
Indirect RF source (1) | 87 ± 6 | 13 ± 12 | 0.41 ± 0.05 | 0.886 |
PCC (2) | 56.3 ± 0.6 | 5.1 ± 1.6 | < 4 | 0.360 |
RF Ar jet (3.I) | 91 ± 6 | 7 ± 4 | 2 ± 0.5 | 1.046 |
RF Ar jet (3.II) | 92.6 ± 0.4 | 8.4 ± 1.7 | 1.5 ± 0.5 | 1.131 |
RF He jet (3.III) | 58.0 ± 2.9 | 3.4 ± 1.3 | 1 ± 0.5 | 0.377 |
RF He jet (3.IV) | 37 ± 29 | 2.2 ± 1.1 | 1 ± 0.5 | 0.201 |
vDBD (4.I) | 99.981 ± 0.005 | 94 ± 5 | 24.2 ± 0.2 | 3.721 |
vDBD (4.II) | 99.980 ± 0.018 | 86 ± 9 | 14.8 ± 0.2 | 3.699 |
vDBD (4.III) | 99.9 ± 0.5 | 97.4 ± 2.0 | 5.4 ± 0.2 | 3.000 |
Ar jet (5.I) | 81 ± 7 | 11.2 ± 1.9 | 12.2 ± 0.2 | 0.721 |
Ar jet (5.II) | 85 ± 21 | 10.8 ± 2.7 | 7.7 ± 0.2 | 0.824 |
Ar jet (5.III) | 88 ± 6 | 10 ± 7 | 4.6 ± 0.2 | 0.921 |
CD (6) | 54 ± 35 | 0.0 ± 0.1 | 1.1 ± 0.2 | 0.337 |
MiniJet (7) | 99.3 ± 0.4 | 15.4 ± 1.2 | 5 | 2.155 |
