We report a unique low-temperature-processed (≤100 °C) method for the scalable deposition of a tellurium nanowire network (Te-nanonet) to fabricate high-performance field-effect transistors (FETs) with stable electrical and optical properties. A maximum mobility of 4.7 cm2/Vs, an on/off current ratio of 1 × 104, and a maximum transconductance of 2.18 µS are achieved. The electrical performance of a Te-nanonet-based transistor array of 42 devices is also measured, revealing stable and uniform results. Finally, to broaden the applicability of p-type Te-nanonet-based FETs, optical measurements are demonstrated over a wide spectral range, revealing an exceptionally uniform optical performance.
- Muhammad Naqi
- Kyung Hwan Choi
- Jae-Young Choi