This is a preview of subscription content, access via your institution
Access options
Subscribe to this journal
Receive 51 print issues and online access
$199.00 per year
only $3.90 per issue
Buy this article
- Purchase on SpringerLink
- Instant access to the full article PDF.
USD 39.95
Prices may be subject to local taxes which are calculated during checkout
References
Energy Beam-Solid Interactions & Transient Thermal Processing (eds Fan, J.C.C. & Johnson, N.M., North-Holland, 1984).
Laser and Electron-Beam Interactions with Solids (eds Appleton, B.R., & Celler, G.K., North-Holland, 1982).
Auston, D.H., et al. Appl. Phys. Lett. 33, 437 (1978).
Lowndes, D.H. Phys. Rev. Lett. 48, 267 (1982).
Pospieszczyk, A. et al. J. appl. Phys. 54, 3176 (1983).
Larsen, B.C. et al. Appl. Phys. Lett. 42, 282 (1983).
Becker, R.S. et al. Phys. Rev. Lett. 52, 307 (1984).
Galvin, G.J. et al. Phys. Rev. Lett. 48, 33 (1982).
Liu, J.M. et al. Appl. Phys. Lett. 41, 643 (1982).
Boyd, I.W. et al. Appl. Phys. Lett. 45, 80 (1984).
Shank, C.V. et al. Phys. Rev. Lett. 50, 454 (1983).
Shank, C.V. et al. Phys. Rev. Lett. 51, 900 (1983).
Hulin, D. et al. Phys. Rev. Lett. 52, 1998 (1984).
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Boyd, I., Moss, S. Semiconductor technology: Kinetics of pulsed laser annealing. Nature 313, 100 (1985). https://doi.org/10.1038/313100a0
Issue date:
DOI: https://doi.org/10.1038/313100a0
