Figure 6
From: Enhancing precision in fs-laser material processing by simultaneous spatial and temporal focusing
Simulation of plasma channels induced by conventional focusing (left column, (a–d)) and SSTF (right column, (e–h)) at 1 µJ, 2 µJ, 4 µJ and 8 µJ, respectively. Iso-electron density surface plots are shown at 1019 cm−3. SSTF, simultaneous spatial and temporal focusing.
