Figure 1
From: Optically controlled magnetic-field etching on the nano-scale
Polarisation-dependent etching. (a) and (c) are AFM images taken before etching. (b) and (d) are AFM images after 3 h. Perpendicular (x-polarised) and parallel (y-polarised) samples are shown in (b) and (d), respectively. Images (a) and (b), and (c) and (d), were obtained at the same respective positions. (e–g) Cross-sectional profiles of x-polarised samples. Red dashed line: pre-etched sample in (a), red solid line: etched sample in (b), black solid line: difference in height before and after etching. The pre-etched widths, wb, were (e) 411.17, (f) 432.81, and (g) 454.45 nm. (h–j) Cross-sectional profiles of y-polarised samples. Blue dashed line: pre-etched sample in (c), blue solid line: etched sample in (d), black solid line: difference in height before and after etching. wb were (h) 414.06, (i) 424.41, and (j) 445.11 nm. (k) Etching height as a function of w.
