Abstract
A furan-containing polymer turned to a gel and then solidified in 1,1,2,2-tetrachloroethane solution in the presence of fullerene C60 under visible light irradiation. The reaction mechanism involved the polycondensation of furan units via singlet oxygen generated from the excited triplet state of C60. This photo-crosslinking process was applied to a photoresist having sensitivity in the visible region. The first example was demonstrated for the micron size photolithographic patterning using the furan-containing polymer/fullerene system.
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Tajima, Y., Tezuka, Y., Ishii, T. et al. Application of a Furan-Containing Polymer/Fullerene System to Photolithography. Polym J 29, 1016–1019 (1997). https://doi.org/10.1295/polymj.29.1016
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DOI: https://doi.org/10.1295/polymj.29.1016
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