Abstract
This paper describes the photochemical surface modification of a solid substrate using a photoreactive polymer nanosheets. A neo-pentylmethacrylamide-co-phenylmethacrylamide (p(nPMA/PhMA)), which has been reported to form a stable monolayer was transferred onto a solid substrate using the Langmuir-Blodgett (LB) technique. The p(nPMA/PhMA) copolymer was deposited with different number of layers onto a solid substrate. Then the wettability change after deep UV-irradiation was observed. The water contact angle (CA) of a substrate coated with p(nPMA/PhMA) nanosheet initially shows a value of 80° attributed to alkyl and phenyl side chains of p(nPMA/PhMA). After 30 min irradiation, the water CA of the surface decreases to 14° because of formation of carbonyl groups (COO) of ketone, aldehyde and carboxylic acid from photodecomposition of the nanosheet. The decrease in contact angle depends on number of deposited layers: a thicker film implies smaller surface CA. Results of UV-vis spectroscopy, Fourier transform infrared spectroscopy (FT-IR), and X-ray photoelectron spectrscopy (XPS) suggest that more numerous nanosheets produce more oxygen containing species after deep UV irradiation, which implies that the number of the deposited nanosheets can control surface wettability.
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Sultana, S., Matsui, J., Mitsuishi, M. et al. Thickness Dependence of Surface Wettability Change by Photoreactive Polymer Nanosheets. Polym J 40, 953–957 (2008). https://doi.org/10.1295/polymj.PJ2008088
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DOI: https://doi.org/10.1295/polymj.PJ2008088
