Fig. 1: The schematic diagram of the IL-GPSE process. | Light: Science & Applications

Fig. 1: The schematic diagram of the IL-GPSE process.

From: Spatial modulation of nanopattern dimensions by combining interference lithography and grayscale-patterned secondary exposure

Fig. 1

Step 1, a two-beam IL is performed on the photoresist to form periodic latent exposed regions with sinusoidal dose profile. Step 2, a secondary exposure follows the IL exposure and increases the effective dose applied to the photoresist which increases the portion of photoresist that receives above-threshold dose, and then leaves less photoresist after development

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