Fig. 4: Film thickness measurements using the MSI model fit. | Light: Science & Applications

Fig. 4: Film thickness measurements using the MSI model fit.

From: Microsphere-assisted hyperspectral imaging: super-resolution, non-destructive metrology for semiconductor devices

Fig. 4

Measured MSI spectra and their model fit for the three different SiO2 film samples (#3, #4, #6) where the desired film thickness values are 298.7 nm (a), 199.9 nm (b), and 3.5 nm (c), respectively. Spectral data is acquired with a 16 × 16 pixel binning at the center of captured images in (a–c). d Captured image of the sample. e Spectral uniformity along the line denoted in (d) as a solid yellow line. They are RMSE values between spectrum at the selected position and spectrum at the center. f Thickness values estimated by MSI fit. Dashed red lines in (d–f) represents the region where MSI model fit is valid

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