Table 1 Water contact angles and surface roughness of each sample

From: CO2 gas-triggered wettability control of silylation-modified CNC films by manipulating the surface structure and introducing tertiary amino groups

Silane compounds for CNC modification

Process

WCA (°)

RMS roughness (nm)

before CO2 treatment

after CO2 treatment

after H2O treatment

Unmodified CNC

–

28

–

–

2.4

TEOS/HTES

First stage

83

81

83

3.8

TEOS/HTES/DMAPS

Second stage

73

22

67

4.2

TEOS/MTES/DMAPS

Second stage

62

38

–

3.0

TEOS/HTES/DMAPS

Simultaneous

70

63

–

3.9

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