Fig. 2: Optical and electrical characteristics of ultrathin transparent electrodes.

a Schematic of destructive interference in Ag films with antireflection layers. b Cross-sectional bright field-TEM image of top DMD film with thicknesses of 5, 8, and 30 nm. c SEM images of the PEI/Ag and PEI/Ag/ZnO films with 8 nm thickness. d Comparison of Rsheet according to Ag layer thickness in PEI/Ag/ZnO (5/x/50 nm) and DMD (5/x/30 nm) electrodes. e Comparison of AVTs according to Ag layer thickness in PEI/Ag/ZnO (5/x/50 nm) and DMD (5/x/30 nm). e Comparison of AVTs according to Ag layer thickness in PEI/Ag/ZnO and DMD electrodes. CIE coordinates of the (f) PEI/Ag/ZnO and (g) DMD electrodes with varying Ag layer thickness. h Photographs captured without filter (left), through DMD electrode (middle) and PEI/Ag/ZnO (right) electrode. The Ag layer thickness in the top and bottom electrodes was 8 nm.