Extended Data Fig. 3: HRTEM and EDS line scanning measurement of LM/AlN heterointerface.
From: Mechanochemistry-mediated colloidal liquid metals for electronic device cooling at kilowatt levels
a, HRTEM image and corresponding EDS mapping results of LM/AlN heterointerface with a mechanochemical time of 30 seconds. b, EDS line scanning results of N, Al, Ga, In, and Sn along the marked yellow arrow. The thickness of the Al-LM heterointerface is about 13.07 nm. c, HRTEM image and corresponding EDS mapping results of LM/AlN heterointerface with a mechanochemical time of 30 minutes. d, EDS line scanning results of N, Al, Ga, In, and Sn along the marked yellow arrow. The thickness of the Al-LM heterointerface is approximately 33.90 nm.
