Extended Data Fig. 5: Integrated nanoimprint active-matrix micro-QLEDs.

a, Schematic illustration of the fabrication process for the active-matrix micro-QLED display. The fabrication process includes four main steps: (i) Cleaning of the TFT array substrate; (ii) Deposition of functional layers, including PEDOT:PSS and TFB, followed by nanoimprinting of red QD stripe patterns with a period of approximately 780 nm; (iii) Red QD stripe nanopatterns remained after PDMS stamp removal; (iv) Deposition of the remaining functional layers by spin-coating PMMA and ZnMgO, followed by electrode deposition and device encapsulation. b, Optical image of the TFT array substrate. c, AFM characterization of the line-patterned template employed for PDMS mold fabrication. The inset shows the height profile extracted from the AFM image. d, Photograph of the integrated nanoimprint active-matrix micro-QLEDs. The nano-patterned QD nanostripes are uniformly and reproducibly nanoimprinted across the TFT array substrate over a large area. Each microscale pixel unit (300 μm × 150 µm) contains hundreds of these nanoscale QD line structures. e, Fluorescence microscopy image of the patterned red QD nanostripes. f, Displayed images generated by a micro-QLED active-matrix prototype based on a commercial TFT array (300 μm × 150 μm pixel dimensions).