Extended Data Fig. 3: Nanoimprint patterning of high-resolution QD arrays on rigid and flexible substrates.

a, Schematic diagram of large-area patterning of ultra-high resolution QD array by nanoimprint lithography assisted by capillary force. Schematic illustration of the fabrication steps: (i) A lithographic pattern was written by laser direct writing onto a positive photoresist-coated substrate, without development. (ii) A QD array was imprinted onto the surface of the patterned photoresist. (iii) After solvent evaporation, the PDMS mold was peeled off, leaving the QD array deposited onto the photoresist surface. (iv) Development was then carried out, resulting in photoresist structures overlaid with QD arrays on either rigid (for example, Si) or flexible (for example, PET) substrates. 5° (b), 10° (c), 15° (d), and 20° (e). The integrity of the pattern type and shape is well preserved, demonstrating excellent mechanical flexibility and structural robustness of the imprinted QD arrays.