Extended Data Fig. 1: Atomic force microscopy data of HfOxNy (8 Å, five atomic layer deposition cycles) on silicon.
From: Sensitization of silicon by singlet exciton fission in tetracene
The film quality was monitored using atomic force microscopy (Veeco Metrology Nanoscope V 3100 SPM; tip, HQ:NSC14/AL BS). The film thickness was monitored using ellipsometry (J. A. Woollam VASE ellipsometer). 500 cycles correspond to a thickness of 83 nm. RMS, root mean square.
