Extended Data Fig. 1: Process control with spectral response.
From: A submicrometre silicon-on-insulator resonator for ultrasound detection
a–c, Monitoring the reflection spectrum of a SWED with Δw = 40 nm (SWED340nm) during the polishing process of the SOI chip: before the start of polishing (a); at the end of polishing and before the application of the Ag coating (b); and after the application of the Ag coating (c).
