Extended Data Fig. 4: v-SiO₂ interatomic distances and angles.

(a) Calculated Si-O, O-O, and Si-Si distances at maximum of the distribution in our densified vitreous silicas. Si-O bond length are compared to X-Ray (squares) and neutron (+) scattering data. Si-Si distances are compared to those in the crystalline polymorphs. For stishovite, the interval corresponds to pressures between 10 GPa and 30 GPa. (b) Si-O-Si bond angle distribution (BAD) and pressure dependence of the Si-O-Si BAD marked by the arrow. The average value has been calculated from 110^o to 175^o. (c) Pressure dependence of the O-Si-O and examples of bond angle distributions (BAD).