Extended Data Fig. 6: Dual epitaxy of vertical 2D fin-oxide heterostructure arrays on diverse insulating substrates.
From: 2D fin field-effect transistors integrated with epitaxial high-k gate oxide

Using chemical vapour synthesis, the 2D layered Bi2O2Se fins are first epitaxially prepared as backbones and then partially and intercalatively oxidized into 2D layered Bi2O2Se/Bi2SeO5 fin-oxide heterostructure arrays on LaAlO3 (100) (a,b), MgO (110) (c,d), CaF2 (110) (e,f), LaAlO3 (110) (g,h), SrTiO3 (110) (i,j) and KTaO3 (110) (k,l) substrates.