Extended Data Fig. 1: The impact of process steps on transistor performance and the complete fabrication process flow for RV32-WUJI.
From: A RISC-V 32-bit microprocessor based on two-dimensional semiconductors
a,We divided the process steps for wafer-level circuits into nine main modules and utilized machine learning to analyze the transistor performance under thousands of different process conditions, thereby studying in detail the impact of each process step on transistor performance. This approach effectively helped us determine the optimal wafer-level process flow.b,The integration at the wafer level involves four metal layers (M0-M3) and can be divided into three main parts: (1-2), synthesis of MoS2 on a rigid substrate; (3-7), preparation of the MoS2 transistors; and (8-13), back-end-of-line process. The diagram illustrates the interconnection of a full adder with an inverter.
