Extended Data Fig. 1: Nanofabrication of WO3 nanodisks.
From: Video‐rate tunable colour electronic paper with human resolution
The reflective layer (Al/Pt), Au layer were deposited by e-beam evaporation and the WO3 layer was deposited by RF magnetron sputtering. After spin-coating an e-beam resist, nanopatterns are defined through e-beam lithography and developed to form structured resist templates. The patterns are then transferred onto the WO3 layer using ion beam milling (IBM) and reactive ion etching (RIE). Finally, the Au mask is removed by wet etching. An SEM image of a blue WO3 nanodisk pixel is presented as an example. Scale bar: 400 nm.
