Extended Data Fig. 4: Multilayered shields composed of Al2O3 and Cu.
From: Electromagnetic interference shielding using metal and MXene thin films
a, Shielding characteristics of bilayer and sandwich structures. For comparison, single-layer Al2O3 and Cu films were also evaluated. b-d, Al2O3-based vertical capacitors. Cross-sectional schematic and plain-view photographic image of the devices (b). Voltage ramping test conducted to confirm the insulating properties of the Al2O3 film. (c). Dielectric constant of the Al2O3 film, determined from capacitance-voltage characteristics measured at 1 MHz (d). e, Effect of stacking configuration on average SE values. f, Plausible EMI shielding mechanisms of the sandwich and bilayer structures. Error bars in e are s.d. from 3–5 samples.
