Extended Data Fig. 5: Measurement of subdiffraction linewidths.
From: 3D nanolithography with metalens arrays and spatially adaptive illumination
a, SEM image of a large array of suspended nanowires printed by a uniformity-corrected system (metalens NA: 1.0). b, A survey of lateral and axial linewidths by randomly selecting lines printed by different metalenses (standard deviation = 16.5 nm (lateral) and 15.4 nm (axial), n = 10). c, Lateral measurements for randomly selected nanowires. d, Axial measurements for randomly selected nanowires.
