Figure 1
From: Combined magnetron sputtering and pulsed laser deposition of TiO 2 and BFCO thin films
Combined Pulsed Laser Deposition + Magnetron Sputtering System. The target is exposed to the PLD laser (the dark purple vertical plume in the picture) and to the plasma generated by the sputtering system (in light purple in the picture) at the same time. B represents the magnetic field while E is the electric field.
