Figure 2

Schematic of fabrication process for Ag/TiO2 nanocomposite architecture: (a),(b) Formation process of nanocomposite wires with polymer pattern on PMMA film substrate based on nanoimprint lithography; (c),(d) UV-curing for 180 s and stamp detachment; (e)–(g) Formation of Ag/TiO2 nanocomposite wires by E-beam evaporator; (h),(i) Cross alignment and nanowelding process of Ag/TiO2 nanocomposite wires at the temperature of 90 °C, 0.5 MPa pressure, for 10 min under vacuum state; (j),(k) Detachment process and formation of Ag/TiO2 nanocomposite cross architecture with two layers; (l) Formation of Ag/TiO2 nanocomposite cross architecture with three layers by repeating process shown in (i),(j).