Figure 8
From: Contamination-free graphene by chemical vapor deposition in quartz furnaces
Temperature-time profile during a typical growth. (I) Insertion in the chamber, (II) evacuation and setting of the gas flows for annealing (Ar, H2), (III) insertion in the furnace hot zone and annealing, (IV) growth, (V) extraction from the hot zone and rapid cooling under Ar, (VI) filling with Ar and extraction from the chamber.
