Figure 1
From: Defect generation in Pd layers by ‘smart’ films with high H-affinity
Hydrogen-induced surface topography changes of Pd/Nb/Al2O3 films measured in situ by STM. (a–c) Pd0.2nm/Nb40 nm/Al2O3: (a) before hydrogen exposure, (b) during hydrogen exposure at p H = 1.6 × 10−6 mbar for 100 min, (c) during hydrogen exposure at p H2 = 3 × 10−6 mbar for 135 min. (d–f) Pd0.2nm/Nb25nm/Al2O3: (d) before hydrogen exposure; (e) during hydrogen exposure at p H2 = 7 × 10−7 mbar for 690 min; (f) during hydrogen exposure at p H2 = 1.6 × 10−6 mbar for 300 min. (g) Line scan taken along the black dotted lines in (b,h) line scan taken along the black dotted lines in (e) (Frame sizes a) 1000 × 1000 nm2, (b) 2000 × 2000 nm2, (c) 2000 × 2000 nm2, (d,e) 500 × 500 nm2, (f) 1500 × 1500 nm2).
