Figure 2
From: Defect generation in Pd layers by ‘smart’ films with high H-affinity
Hydrogen-induced microstructural changes measured by in situ XRD. (a,b) Pd20nm/Nb55nm/Al203 and (c,d) Pd20nm/Nb28nm/Al203. (a) Change of XRD patterns observed during hydrogen exposure at pressures of up to p H2 = 20 mbar (b) FWHM of the Pd (111) peak plotted in dependence on the peak position and the hydrogen pressure. (c) Change of XRD patterns observed during hydrogen exposure at pressures of up to p H2 = 5 mbar. Coherent phase transformation occurring within the Nb-H system is visible via the intermediate peak broadening. No separated hydride-related peak is detected. (d) FWHM of the Pd (111) peak plotted in dependence on the peak position. The shift of the Pd peak to higher 2θ angles and the increase of the FWHM indicate on the stress release and an increased mosaicity of the film. (λ = 1.078 Å).
