Table 1 Proportion of the integrated PL of different peaks of un-etched and etched InPBi specimens.

From: Nanoscale distribution of Bi atoms in InP1−xBix

Integrated PL

LE Peak

ME Peak

HE Peak

NE Peak

Un-etched × 0.5

45.58%

28.81%

25.61%

/

Etch 220 nm

23.67%

30.50%

45.83%

/

Etch 320 nm

19.50%

25.37%

55.13%

/

Etch 380 nm

/

/

46.96%

53.04%