Figure 1
From: Fabrication of Subnanometer-Precision Nanopores in Hexagonal Boron Nitride
Schematic of our nanopore fabrication method. (a) Starting from pristine h-BN a TEM electron beam is condensed to 10–20 nm area. (b) Triangular defects form under the condensed beam, mostly near the center, allowing for the stripping of the h-BN layer by layer. (c) After the formation of a single few-atom vacancy in the final layer, the beam is spread. (d) Under a lower beam energy density, the pore is grown to the desired size.
