Table 1 Wheat seed germination and seedling growth under drought stress before and after DBD plasma treatment. (The discharge voltage is 13.0 kV, and the DBD plasma treatment time is 4 min. GP is sampled on the 1st day of planting. GR4, root length, and shoot length are sampled on the 4th day of planting. GI and GIDR are sampled on the 8th day of planting. Data are presented as the mean ± SD (n = 3). Different lower case letters (a-d) indicate statistically significant differences at the P < 0.05 level).

From: Alleviation of adverse effects of drought stress on wheat seed germination using atmospheric dielectric barrier discharge plasma treatment

Treatment groups

GP (%)

GR4 (%)

GI

GIDR

Root length (mm)

Shoot length (mm)

watered

62.5 ± 6.1b

88.0 ± 3.5b

2.120 ± 0.041b

1573.7 ± 79.8b

468.8 ± 5.6b

plasma + watered

77.5 ± 4.3a

95.3 ± 3.2a

2.346 ± 0.058a

1759.3 ± 46.4a

490.9 ± 5.1a

drought stress

39.3 ± 3.1d

62.7 ± 3.1d

1.502 ± 0.045d

0.708

727.0 ± 24.2d

153.1 ± 12.3d

plasma + drought stress

50.0 ± 4.0c

80.0 ± 2.0c

1.912 ± 0.063c

0.815

872.3 ± 62.3c

201.9 ± 12.2c