Figure 6
AFM height images of the bSi/PCBM films on silicon wafers with bSi concentrations of (a) 0.22 g/L, (b) 0.44 g/L, (c) 0.88 g/L, (d) 0.66 g/L, (e) 1.31 g/L, and (f) 1.75 g/L and a fixed PCBM concentration of 10 g L−1. (g) Out-of-plane XRD pattens of the bSi/PCBM films on silicon wafers with different surface modifier concentrations. The patterns are shifted in the y-axis for clarity. The films were spin-coated on silicon wafers and thermally annealed at 160 °C.
