Figure 9
From: Understanding the effect of wet etching on damage resistance of surface scratches
Evolution of the intensity (E²) distribution on an AFM cross-section perpendicular ((a) and (c)) or centered parallel ((b) and (d)), before ((a) and (b)) and after ((c) and (d)) a 12 µm HF/HNO3 wet etch. 2D finite-element modeling in TE polarization. Maximal intensity is decreased by the deep wet etching.
